光栅的衍射波面误差是衍射光栅的重要性能指标之一，对系统性能起到了决定性的作用。本论文基于宽光束扫描曝光方法制作全息光栅，研究并解决其在制作大尺寸光栅时的波面误差累积问题，并利用该方法对像差的平均作用制作低衍射波面误差光栅。针对大尺寸光栅的制作，由于宽光束扫描曝光方法是自参考系统，因此某一时刻的误差会持续性影响后续潜像光栅，从而导致衍射波面误差随着扫描距离的增加而增大，即波面误差累积。本论文研究了误差累积的产生原因，通过建立扫描曝光过程的数学模型，指出存在误差累积时所制作光栅的衍射波面呈现45°像散形式分布。进一步指明系统主要存在两种误差来源：初始记录误差和波面匹配误差。发现二者之间存在补偿性，并提出误差补偿方案，有效抑制了波面误差累积。在控制方法上，使用自动控制理论研究扫描曝光系统，通过引入模糊控制的方法自适应调整条纹锁定参数，使系统不会持续性发散。最终制作出了大小为200 mm × 100 mm、有效口径为160 mm × 90mm，衍射波面误差小于0.1 λ且不存在45°像散的光栅。针对小尺寸光栅的制作，本论文研究了宽光束扫描曝光方法对沿扫描方向曝光场像差的平均作用。由于扫描曝光方法对不同像差的平均效果是不同的，因此我们通过泽尼克多项式将常见的像差分类，研究了当曝光场存在5种常见的初级像差时扫描曝光所制作的光栅衍射波面。实验上分别使用了具有0.4 λ的离焦和0.16 λ的复杂像差的曝光场进行扫描曝光，最终得到的光栅衍射波面误差为0.23 λ以及0.08 λ，衍射波面误差分别下降了42.5%和50%。本论文还研究了扫描曝光方法所制作光栅的均匀性，证实了扫描曝光可以有效提升全口径内光刻胶掩模的均匀性。通过在同一块光栅掩模不同位置处采样并使用扫描电子显微镜观察微观槽形，计算了所制作光栅的占宽比和槽深的标准差。对槽深约280 nm、占宽比约0.27的光栅掩模，静止曝光光栅掩模的占宽比标准差为0.054，槽深的标准差为41.9 nm；相同实验条件下扫描曝光光栅掩模在70 mm × 100 mm口径内占宽比的标准差为0.017，槽深的标准差为22.3 nm。扫描曝光光栅掩模的占宽比标准差和槽深标准差分别约是静止曝光光栅掩模的1/3.2和1/1.9。

The diffracted wavefront error is one of the key parameters of diffraction gratings, which plays a crucial role in many optical systems. In this dissertation, we use the broad-beam scanning exposure to fabricate holographic gratings, and investigate the wavefront error accumulation effect of this method. Further, the broad-beam exposure was used to fabricate gratings with low diffracted wavefront errors based on the averaging effect of this method on the phase aberration of the exposure field.For the fabrication of large-size gratings, because the broad-beam scanning exposure system is a self-reference system, errors at a certain time continuously affect the subsequent latent gratings, resulting in increased diffracted wavefront errors with the increase of the scanning length. This process is termed error accumulation. In this dissertation, the cause of error accumulation is studied. By establishing the mathematical model of the broad-beam scanning exposure, we find that the diffracted wavefront distributes as a diagonal astigmatism if there exists error accumulation. There are two main error sources in this system: initial recording error and wavefront matching error. These two errors can be mutually compensated, and the compensation effect is utilized to restrain the wavefront error accumulation. For control systems, the automatic control theory is used to study the broad beam scanning system. The fuzzy control method is proposed to adaptively adjust the fringe locking parameters, so that the divergence of the system is suppressed. Gratings with a size of 200 mm × 100 mm were fabricated. The diffracted wavefront errors were less than 0.09 λ with an effective aperture of 160 mm × 90 mm, and the wavefront distributions had no diagonal astigmatism.For the fabrication of small-size gratings, we study the averaging effect of the broad-beam scanning exposure on the phase aberration of the exposure field. Since the averaging effects on different phase aberrations are different, we classify the common phase aberrations of the exposure field by Zernike polynomials. We study the diffracted wavefront errors of the gratings fabricated by the scanning method when there exist five common primary aberrations in the exposure field. In the experiment, exposure fields with a defocus phase aberration with 0.4 λ peak-valley value and a more complex phase aberration with 0.16 λ peak-valley value were used to fabricate gratings, and the resulting diffracted wavefront errors were 0.23 λ and 0.08 λ, which means 42.5% and 50% reductions, respectively.We also studied the uniformity of the gratings fabricated by broad-beam scanning method. It is proved that the broad beam scanning process can effectively improve the uniformity of the fabricated grating photoresist masks. We sampled at different positions on the fabricated grating masks and observed the grating masks by the scanning electron microscope. Further, the standard deviations of the duty cycle and the groove depth were calculated. For the grating photoresist masks with a groove depth of about 280 nm and a duty cycle of about 0.27, the standard deviations of the duty cycle and the groove depth of the grating masks fabricated by the stationary exposure method were 0.054 and 41.9 nm, respectively. With use of the same experimental setup, the standard deviations of the duty cycle and the groove depth of the grating masks fabricated by the scanning method were 0.017 and 22.3 nm in the aperture of 70 mm × 100 mm, respectively. The standard deviations of the duty cycle and the groove depth of the grating masks fabricated by the scanning method were about 1/3.2 and 1/1.9 of the grating masks fabricated by the stationary exposure method, respectively.