以内表面为工作面的零部件广泛应用于日常生活、工业生产及国防等领域。为减缓摩擦磨损及提高工件寿命，需要在内表面制备强化涂层。由于阴影效应对涂层材料进入工件的阻碍，内表面涂层的厚度均匀性通常较低。本文以能源装备水压驱动系统缸套的内表面涂层制备需求为背景，针对磁场辅助电弧离子镀在内表面涂层制备中的应用开展研究。针对能源装备水压驱动系统缸套的模拟件，利用带电粒子追踪数值模拟方法，研究了磁场强度、空间位置以及磁场与电场的协同作用对离子运动轨迹的影响规律。结果表明，离子沉积的数量和位置随特征磁场强度的增加呈周期性变化。一定特征强度范围的磁场可牵引离子进入工件，增加沉积到内表面的离子数量。偏压电场由于其梯度分布，牵引离子进入工件管口，增加了可供磁场调控运动的离子数量。离子在与气体分子碰撞过程中改变运动方向，并在磁场与电场的协同作用下向工件深处旋进，增加了距管口轴向的沉积距离以及沉积效率。根据数值模拟的优化结果，研制了内置于电弧离子镀真空室的磁场辅助装置，可通过辅助磁场对离子轨迹进行实时控制。所使用的线圈采用带式绕组结构，具备一定的耐温性能，在真空中的稳定工作时间不少于30分钟，且不影响本底真空度和工作真空度。大气环境热像分析实验表明，线圈90分钟内的最大温升不超过200 ℃，处于导线绝缘材料容许的范围之内。针对能源装备水压驱动系统缸套的模拟件，分别开展了磁场/电场辅助制备内表面Ti和TiN涂层的实验研究。结果表明，改变辅助磁场的强度及其空间位置可显著提高涂层厚度及其均匀性。对于磁场中心设于工件中心的情形，在特征磁场强度460 Gs时，Ti涂层厚度均匀性达到最高值23.6%；对磁场中心设于工件管口的情形，在特征磁场强度460 Gs时，Ti涂层厚度均匀性达到最高值37.8%。在TiN涂层的制备中，辅助磁场可显著提高涂层厚度及其均匀性，涂层厚度均匀性的最大值达到了51.1%。辅助磁场使管尾处涂层厚度显著提高，降低了内表面涂层的轴向厚度差，从而提高了涂层厚度均匀性，实验结果与模拟结果取得了一致。

Components with inner working surfaces are widely used in daily life, industrial production, national defense and other fields. To reduce friction and wear and prolong the working life, inner surface coating technology has been used. Due to the shadow effect, the coating materials are difficult to enter the workpiece, leading to the lack of thickness uniformity of inner surface coatings. Aiming at the inner surface coatings requirement of the cylinder bores in hydraulic-driving system of energy equipment, the magnetic field assisted arc ion plating for inner surface coatings preparation was researched.For the simulant of a cylinder bore in hydraulic-driving system of energy equipment, the charged particle tracing simulation was conducted to study the influence of magnetic field intensity, location and the co-effect of magnetic and electric field on the trajectories of ions. Results showed that the number and position of the ions that deposited on the inner surface changed periodically with the increase of characteristic magnetic flux density. Ions were guided inside the simulant by magnetic field under a specific range of intensity. The electric field of simulant bias attracted ions to the inlet of the simulant, increasing the number of ions guided by magnetic field. Ions changed direction after collisions with working gas molecule, and moved in spirals deep inside the simulant under the co-effect of magnetic and electric field, increasing the distance towards the pipe inlet and deposition efficiency.According to the results of numerical simulation, a magnetic assisting device was developed inside the arc ion plating chamber. An auxiliary magnetic field was established during the arc ion plating to control the trajectories of ions. The coil was set with belt winding structure, and had stable working time. The device can also work in the environment of arc ion plating without affecting the background pressure and working pressure. The results of thermal image analysis under atmosphere indicated that the maximum temperature rise of the coil in 90 minutes is lower than 200 ℃, which was within the allowable range of the wire insulation material.Ti and TiN coatings were deposited on the inner surface of the simulant, respectively. The deposition was assisted by magnetic/electric field. Results showed that the thickness and thickness uniformity of the inner surface coatings could be significantly improved by changing the intensity and spatial position of the auxiliary magnetic field. When the center of the coil was aligned to the center of the simulant, the thickness uniformity of Ti coatings was up to 23.6% under characteristic magnetic flux density 460 Gs. When the center of the coil was aligned to the inlet of the simulant, the thickness uniformity of Ti coatings was up to 37.8% under characteristic magnetic flux density 460 Gs. For the preparation of TiN coatings, the thickness uniformity of TiN coatings was up to 51.1% under magnetic field. Besides, the coating thickness near the pipe outlet increased significantly. Hence, the difference of coating thickness along the axis was reduced, improving the coating thickness uniformity. The experimental results were consistent with the simulation.